Surface preparation techniques are used to investigate deposition at interstitial surface abnormalities during silver photoreduction on polarity patterned lithium niobate. The technique of ferroelectric lithography ideally results in monodisperse silver nanowires preferentially deposited at boundaries between ferroelectric domains, but unwanted interstitial accumulation occurs most frequently along subnanometer surface scratches. It is shown that roughing the surface creates discontinuities that promote interstitial growth. Treating the surface by electron bombardment can change crystallographic orientation resulting in regions of random domain alignment and would presumably not remove surface scratches. However, the electron treatment prevents domain wire growth and interstitial accumulation. This suggests only scratches on +C and -C surface are conducive to deposition. Silver nanowires synthesized by ferroelectric lithographic techniques are candidates for creating a substrate for surface enhanced Raman spectroscopy (SERS) or as an alternative route for producing nanoconductors.